INNOVATIVE ALD TECHNOLOGY THROUGH SCIENCE & ENGINEERING
Anric Technologies is focused on Atomic Layer Deposition (ALD), a thin film deposition technology. Working with our customers to build innovative thin film solutions with equipment, new precursors and optimized processing
Anric Technologies was founded by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for universities, start-ups, companies exploring ALD, starting pilot line production and specialized manufacturing.
Several novel thin film processes have been developed including a recently patented hybrid ALD process for growing silica films. The AT-410 is a benchtop ALD tool specifically created to fill this gap. The tool design was inspired by observations made while working on a wide variety of deposition processes and device applications at Harvard.
